Cathodic Electrodeposition and Characterization of ni3se2 thin Films

Authors

Anuar K
Zainal Z
Saravanan N
Kartini A.R

Abstract

Nickel selenide thin films have been potentiostatically electrodeposited on titanium substrate at room temperature from aqueous solution containing Ni-EDTA and Na2SeO3. Various deposition potentials were attempted in order to determine the optimum electrodeposition potential. The films were characterised using x-ray diffraction analysis (XRD) and the photoactivity of the electrosynthesised films were studied using linear sweep voltammetry (LSV). The band-gap energy was determined using UV-visible spectroscopy. The XRD analysis indicated the formationof polycrystalline Ni3Se2. The film exhibited p-type semiconductor behaviour with good photosensitivity. The bandgap energy (Eg) was about 1.4eV.

Publication Date

10-27-2017

Recommended Citation

K, Anuar; Z, Zainal; N, Saravanan; and A.R, Kartini (2017) "Cathodic Electrodeposition and Characterization of ni3se2 thin Films," ASEAN Journal on Science and Technology for Development: Vol. 21: No. 1, Article 3.
DOI: https://doi.org/10.29037/ajstd.88
Available at: https://ajstd.ubd.edu.bn/journal/vol21/iss1/3